INDUSTRIAL AIR AND HYDRAULIC TESTING

Measurement and Evaluation of Airflow in the Manufacturing Process of Semiconductors, Automobiles, etc.

Temperature Uniformity in a Heating Chamber of Semiconductor

Application case

Temperature Uniformity in a Heating Chamber of Semiconductor

The production of CMOS has a heating process that reaches around 85 to 90℃. In order to eliminate deterioration of product quality and yield rate due to uneven temperature in the thermostatic chamber, there is a need for designing air flow to eliminate uneven temperature. By Installing of 6 probes in the thermostatic chamber and performing simultaneous measurement to conduct verification and evaluation, airflow is optimized and it helps to improve the quality and yield rate.

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