Application case
Temperature Uniformity in a Heating Chamber of Semiconductor
The production of CMOS has a heating process that reaches around 85 to 90β. In order to eliminate deterioration of product quality and yield rate due to uneven temperature in the thermostatic chamber, there is a need for designing air flow to eliminate uneven temperature. By Installing of 6 probes in the thermostatic chamber and performing simultaneous measurement to conduct verification and evaluation, airflow is optimized and it helps to improve the quality and yield rate.